Title Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions / edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood.

Imprint

Park Ridge, N.J., U.S.A. : Noyes Publications, c1990.

Location	Call Number	Status
Monograph Collection	TA2020 .H37 1990	AVAILABLE

Description	xxiii, 523 p. : ill. ; 25 cm
Series	Materials science and process technology series
Bibliography	Includes bibliographical references.
Contents	Techniques for IC processing / David B. Fraser and William D. Westwood -- Introduction to plasma concepts and discharge configurations / Joseph L. Cecchi -- Fundamentals of sputtering and reflection / David N. Ruzic -- Bombardment-induced compositional change with alloys, oxides, oxysalts, and halides / Roger Kelly -- RF diode sputter etching and deposition / Joseph S. Logan -- Magnetron plasma deposition processes / Stephen M. Rossnagel -- Broad-beam ion sources / Harold R. Kaufman and Raymond S. Robinson -- Reactive ion etching / Gottlieb S. Oehrlein -- Reactive sputter deposition / William D. Westwood -- Plasma enhanced chemical vapor deposition of thin films for microelectronics / Rafael Reif -- Electron cyclotron resonance microwave discharges for etching and thin film deposition / Jes Asmussen.
	Hollow cathode etching and deposition / Chris M. Horwitz -- Ion platting / Donald M. Mattox -- Ionized cluster beam (ICB) deposition techniques / Isao Yamada -- The activated reactive evaporation (ARE) process / Chandra V. Deshpandey and Rointan F. Bunshah -- Formation of thin films by remote plasma enhanced chemical vapor deposition (Remote PECVD) / Gerold Lucovsky, David V. Tsu and Robert J. Markunas -- Selective bias sputter deposition / Soren Berg and Claes Nender -- Formation of thin films by remote plasma enhanced chemical vapor deposition (Remote PECVD) / Gerold Lucovsky, David V. Tsu and Robert J. Markunas -- Selective bias sputter deposition / Soren Berg and Claes Nender -- Vacuum arc-based processing / David Sanders -- Ion-surface interactions : general understandings / Russell Messier, Joseph E. Yehoda and Lawrence J. Pilione -- Ion assisted deposition / James J. McNally.
	Microstructural control of plasma-sputtered refractory coatings / David M. Hoffman and Robert C. McCune.
Subject(s)	Plasma engineering.
	Semiconductors -- Etching.
	Plasma etching.
Alternate Author	Rossnagel, Stephen M.
	Cuomo, J. J.
	Westwood, William D. (William Dickson), 1937-